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Research Article | Open Access

Two-photon lithography for 3D magnetic nanostructure fabrication

Gwilym Williams1,§Matthew Hunt1,§Benedikt Boehm2Andrew May1Michael Taverne3Daniel Ho3Sean Giblin1Dan Read1John Rarity3Rolf Allenspach2Sam Ladak1()
School of Physics and Astronomy Cardiff UniversityCardiff, CF24 3AA UK
IBM Research-ZurichSäumerstrasse 48803Rüschlikon, Switzerland
Department of Electrical and Electronic Engineering University of BristolBristol, BS8 1UB UK

§ Gwilym Williams and Matthew Hunt contributed equally to this work.

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Abstract

Ferromagnetic materials have been utilized as recording media in data storage devices for many decades. The confinement of a material to a two-dimensional plane is a significant bottleneck in achieving ultra-high recording densities, and this has led to the proposition of three-dimensional (3D) racetrack memories that utilize domain wall propagation along the nanowires. However, the fabrication of 3D magnetic nanostructures of complex geometries is highly challenging and is not easily achieved with standard lithography techniques. Here, we demonstrate a new approach to construct 3D magnetic nanostructures of complex geometries using a combination of two-photon lithography and electrochemical deposition. The magnetic properties are found to be intimately related to the 3D geometry of the structure, and magnetic imaging experiments provide evidence of domain wall pinning at the 3D nanostructured junction.

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Nano Research
Pages 845-854
Cite this article:
Williams G, Hunt M, Boehm B, et al. Two-photon lithography for 3D magnetic nanostructure fabrication. Nano Research, 2018, 11(2): 845-854. https://doi.org/10.1007/s12274-017-1694-0
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