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Research Article | Open Access

Growth, coalescence, and etching of two-dimensional overlayers on metals modulated by near-surface Ar nanobubbles

Wei Wei1Jiaqi Pan1Haiping Lin2Chanan Euaruksakul3Zhiyun Li1Rong Huang1Li Wang1Zhujun Wang4,5( )Qiang Fu6( )Yi Cui1( )
Vacuum Interconnected Nanotech Workstation, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
Institute of Functional Nano & Soft Materials (FUNSOM), Soochow University, Suzhou 215123, China
Synchrotron Light Research Institute, Nakhon Ratchasima 30000, Thailand
School of Physical Science and Technology, Shanghai Tech University, Shanghai 200031, China
Scientific Center for Optical and Electron Microscopy, ETH Zürich, 8093 Zürich, Switzerland
State Key Laboratory of Catalysis, iChEM, Dalian Institute of Chemical Physics, the Chinese Academy of Sciences, Dalian 116023, China
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Graphical Abstract

Abstract

The synthesis of high-quality ultrathin overlayers is critically dependent on the surface structure of substrates, especially involving the overlayer–substrate interaction. By using in situ surface measurements, we demonstrate that the overlayer–substrate interaction can be tuned by doping near-surface Ar nanobubbles. The interfacial coupling strength significantly decreases with near-surface Ar nanobubbles, accompanying by an “anisotropic to isotropic” growth transformation. On the substrate containing near-surface Ar, the growth front crosses entire surface atomic steps in both uphill and downhill directions with no difference, and thus, the morphology of the two-dimensional (2D) overlayer exhibits a round-shape. Especially, the round-shaped 2D overlayers coalesce seamlessly with a growth acceleration in the approaching direction, which is barely observed in the synthesis of 2D materials. This can be attributed to the immigration lifetime and diffusion rate of growth species, which depends on the overlayer–substrate interaction and the surface catalysis. Furthermore, the “round to hexagon” morphological transition is achieved by etching-regrowth, revealing the inherent growth kinetics under quasi-freestanding conditions. These findings provide a novel promising way to modulate the growth, coalescence, and etching dynamics of 2D materials on solid surfaces by adjusting the strength of overlayer–substrate interaction, which contributes to optimization of large-scale production of 2D material crystals.

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Nano Research
Pages 2706-2714
Cite this article:
Wei W, Pan J, Lin H, et al. Growth, coalescence, and etching of two-dimensional overlayers on metals modulated by near-surface Ar nanobubbles. Nano Research, 2022, 15(3): 2706-2714. https://doi.org/10.1007/s12274-021-3731-2
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Received: 24 May 2021
Revised: 01 July 2021
Accepted: 03 July 2021
Published: 29 July 2021
© The Author (s) 2021

Copyright: 2021 by the author(s). This article is an open access article distributed under Creative Commons Attribution License (CC BY 4.0), visit https://creativecommons.org/licenses/by/4.0/.

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