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Research Article

Porous-structure engineered spacer for high-throughput and rapid growth of high-quality graphene films

Ziteng Ma1,2,§, Heng Chen1,2,§, Xiaofeng Song2,3, Buhang Chen2,5, Qin Li2, Yanglizhi Li1,2,4, Haiyang Liu1,2, Kaicheng Jia1,2, Shenghong Huang6( ), Luzhao Sun2( ), Zhongfan Liu1,2( )
Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Beijing Graphene Institute, Beijing 100095, China
College of Materials Science and Technology, Beijing University of Chemical Technology, Beijing 100029, China
Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
College of Energy, Soochow Institute for Energy and Materials InnovationS (SIEMIS), Key Laboratory of Advanced Carbon Materials and Wearable Energy Technologies of Jiangsu Province, Soochow University, Suzhou 215006, China
CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Modern Mechanics, University of Science and Technology of China, Hefei 230027, China

§ Ziteng Ma and Heng Chen contributed equally to this work.

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Graphical Abstract

By alternate stacking of Cu foil substrates and porous carbon fiber paper, fast and high-throughput growth of high-quality graphene films can be achieved.

Abstract

Chemical vapor deposition (CVD) in conjunction with batch-to-batch manufacturing process is considered as the most promising technical route for mass-production of high-quality graphene films. To improve the space utilization of the CVD chamber and increase the throughput per batch, stacking of the Cu foil substrates is efficient, but suffers from the problems of adjacent fusion and the poor mass-transfer. Here, we demonstrate an efficient strategy for high-throughput and rapid growth of high-quality graphene by alternate stacking of Cu foils and porous carbon fiber paper (CFP). Relying on the unhindered mass-transfer through the pores of CFPs, full-covered high-quality graphene films on compact-stacked Cu foils were achieved within 2 min. Computational fluid dynamics (CFD) simulation and isotope labeling technique were performed to explore the gas diffusion and graphene growth process in the confined space of the Cu-CFP stacks. This work provides a feasible method for industrial production of graphene films, which may also be used for batch production of other two-dimensional materials.

Keywords

graphenechemical vapor depositionfast growthhigh-throughputbatch-to-batch production

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Nano Research
Volume 15 Issue 11,
November 2022
Pages 9741-9746
DOI: 10.1007/s12274-022-4609-7
Cite this article:
Ma Z, Chen H, Song X, et al. Porous-structure engineered spacer for high-throughput and rapid growth of high-quality graphene films. Nano Research, 2022, 15(11): 9741-9746. https://doi.org/10.1007/s12274-022-4609-7
Topics:
Graphene
Part of a topical collection:
Eighth Nano Research Award

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Received: 29 January 2022
Revised: 30 May 2022
Accepted: 31 May 2022
Published: 01 July 2022
© Tsinghua University Press 2022
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