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Erratum

Erratum to: Grain boundary boosting the thermal stability of Pt/CeO2 thin films

Luyao Wang1, Xiaobao Li2, Xiangchen Hu3, Shuyue Chen3, Zhehao Qiu3, Yifan Wang1, Hui Zhang2, Yi Yu3, Bo Yang3, Yong Yang3, Pasquale Orgiani4, Carmela Aruta5(), Nan Yang1()
Electrochemical thin film group, School of physical science and technology, ShanghaiTech University, Shanghai 201210, China
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
School of physical science and technology, ShanghaiTech University, Shanghai 201210, China
CNR-IOM, TASC National Laboratory, I-34149 Trieste, Italy
CNR-SPIN, UOS Roma, Area della Ricerca di Tor Vergata, Rome I-00133, Italy
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The online version of the original article can be found at:
https://doi.org/10.1007/s12274-022-4899-9

Keywords

platinum doped cerium oxide (Pt/CeO2)pulsed laser depositionepitaxial thin filmsgrain boundariesdefect engineeringin-situ ambient-pressure X-ray photoemission spectroscopy
Nano Research
Volume 16 Issue 2,
February 2023
Pages 3603-3603
DOI: 10.1007/s12274-022-5088-6
Cite this article:
Wang L, Li X, Hu X, et al. Erratum to: Grain boundary boosting the thermal stability of Pt/CeO2 thin films. Nano Research, 2023, 16(2): 3603. https://doi.org/10.1007/s12274-022-5088-6
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