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Research Article

Plasma-etching on monolithic MOFs-based MIM filter boosted chemical sensing

Jianxi Liu1,2( ), Li Feng1,2, Zhihuan Li1,2, Yang Wu3,4, Feng Zhou3,4, Yadong Xu1( )
Research & Development Institute, Northwestern Polytechnical University in Shenzhen, Shenzhen 518057, China
State Key Laboratory of Solidification Processing, Center of Advanced Lubrication and Seal Materials, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi’an 710072, China
Yantai Zhongke Research Institute of Advanced Materials and Green Chemical Engineering, Shandong Laboratory of Advanced Materials and Green Manufacturing at Yantai, Yantai 264006, China
State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China
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Graphical Abstract

A monolithic metal-organic frameworks (MOFs)-based Metal-insulator-metal (MIM) cavity with high color saturation is constructed by sandwiching MOFs film generated by optimized layer-by-layer (LbL) spin-coating method between the gold layers. Reflected color is modulated by optimizing the MOFs thickness. Plasma etching on the cavity allows external chemical diffusion, which realizes the breakthrough enhancement of detection sensitivity. Patterned structure of the cavity is generated via the plasma-mask method to produce a controllable structure color change for chemical sensing.

Abstract

Metal-insulator-metal (MIM) cavity as a lithography-free structure to control light transmission and reflection has great potential in the field of optical sensing. However, the dense top metal layer of the MIM prohibits any external medium from entering the dielectric insulation layer, which limits the application of the cavity in the sensing field. Herein, we demonstrate a series of monolithic metal-organic frameworks (MOFs) based MIM cavities, which are treated by plasma etching to provide channels for chemical diffusion and to advance sensing. We modulate the bandwidth of the MIM filters by controlling the MOF thickness as insulator layers. Oxygen plasma-etching is applied to build channels on the top metal layer without altering their saturation and brightness for chemical sensing performance. The etching time regulates the number and size of channels on the top metal layer. Sensing behavior is demonstrated on the plasma-etched MOFs-based MIM cavity when external chemicals diffuse in the cavity. In addition, we generate patterned structure of the MOFs-based MIM cavity via plasma-mask method, which can transfer to different substrates and produce a controllable structure color change for chemical sensing. Our MIM cavity may promote the advancement and applications of structural color in security imaging, color display, information anticounterfeiting, and color printing.

Keywords

metal-organic frameworks (MOFs)spin-coatingmetal-insulator-metalfilterpatternssensing

Electronic Supplementary Material

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Nano Research
Volume 17 Issue 4,
April 2024
Pages 2800-2807
DOI: 10.1007/s12274-023-6098-8
Cite this article:
Liu J, Feng L, Li Z, et al. Plasma-etching on monolithic MOFs-based MIM filter boosted chemical sensing. Nano Research, 2024, 17(4): 2800-2807. https://doi.org/10.1007/s12274-023-6098-8
Topics:
Chemical sensors DepositionOptical properties

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Received: 07 July 2023
Revised: 02 August 2023
Accepted: 13 August 2023
Published: 26 September 2023
© Tsinghua University Press 2023
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