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Research Article | Open Access

Crystallization and inter-diffusional behaviors in the formation of VO2(B) thin film with layered W-doping

Chuanshuo ZHANGaDongli HUa,b( )Hui GUa,bJuanjuan XINGa,bPing XIONGaDongyun WANaYanfeng GAOa
School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China
Materials Genome Institute, Shanghai University, Shanghai 200444, China
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Abstract

To achieve a better material for uncooled infrared (IR) detector, polycrystalline VO2(B) thin films with layered W-doping were fabricated on Si substrates by magnetron sputtering, and the best temperature coefficient of resistance (TCR) value reached -4.1%/K. The film synthesis was in a two-step route, first deposition at room temperature and then post-deposition annealing at 450 ℃, to better control the crystallization behavior. Various transmission electron microscopy (TEM) methods were employed to investigate three sets of multi-layered films with different deposition time, 10, 20, and 30 min, with especial emphasis on the effect of layered W-doping scheme on the formation of multiple VO2(B) layers. Spatial-resolved energy dispersive X-ray spectroscopy (EDS) revealed the alternative patterns of W-rich layers and W-poor layers, while the thinner films exhibited better crystallinity and texturing. By comparison with an as-deposited film, it was found that the inter-diffusion between the two types of layers was completed in the deposition step while both remained in amorphous structure. A stable W solution of about 8 cat% in VO2(B) layers measured from all these films indicated that the layered doping can tailor the multi-layered microstructure to optimize the performance of VO2(B) films.

References

[1]
N Émond, A Hendaoui, M Chaker. Low resistivity WxV1−xO2-based multilayer structure with high temperature coefficient of resistance for microbolometer applications. Appl Phys Lett 2015, 107: 143507.
[2]
N Fieldhouse, SM Pursel, MW Horn, et al. Electrical properties of vanadium oxide thin films for bolometer applications: Processed by pulse dc sputtering. J Phys D: Appl Phys 2009, 42: 055408.
[3]
H Wang, X Yi, S Chen. Low temperature fabrication of vanadium oxide films for uncooled bolometric detectors. Infrared Phys Techn 2006, 47: 273-277.
[4]
C Venkatasubramanian, OM Cabarcos, DL Allara, et al. Correlation of temperature response and structure of annealed VOx thin films for IR detector applications. J Vac Sci Technol A 2009, 27: 956.
[5]
FJ Morin. Oxides which show a metal-to-insulator transition at the neel temperature. Phys Rev Lett 1959, 3: 34-36.
[6]
J Jian, A Chen, W Zhang, et al. Sharp semiconductor-to-metal transition of VO2 thin films on glass substrates. J Appl Phys 2013, 114: 244301.
[7]
AM Makarevich, II Sadykov, DI Sharovarov, et al. Chemical synthesis of high quality epitaxial vanadium dioxide films with sharp electrical and optical switch properties. J Mater Chem C 2015, 3: 9197-9205.
[8]
H Takami, K Kawatani, T Kanki, et al. High temperature-coefficient of resistance at room temperature in W-doped VO2 thin flms on Al2O3 substrate and their thickness dependence. Jpn J Appl Phys 2011, 50: 055804.
[9]
D Wan, P Xiong, L Chen, et al. High-performance thermal sensitive W-doped VO2(B) thin film and its identification by first-principles calculations. Appl Surf Sci 2017, 397: 30-39.
[10]
Ch Leroux, G Nihoul, GV Tendeloo. From VO2(B) to VO2(R) theoretical structures of VO2 polymorphs and in situ electron microscopy. Phys Rev B 1998, 57: 5111-5121.
[11]
F Guinneton, L Sauques, JC Valmalette, et al. Comparative study between nanocrystalline powder and thin of vanadium dioxide VO2: Electrical and infrared properties. J Phys Chem Solids 2001, 62: 1229-1238.
[12]
Z Mao, W Wang, Y Liu, et al. Infrared stealth property based on semiconductor (M)-to-metallic (R) phase transition characteristics of W-doped VO2 thin films coated on cotton fabrics. Thin Solid Films 2014, 558: 208-214.
[13]
MB Sahana, GN Subbanna, SA Shivashankar. Phase transformation and semiconductor-metal transition in thin films of VO2 deposited by low-pressure metalorganic chemical vapor deposition. J Appl Phys 2002, 92: 6495-6504.
[14]
A Chen, Z Bi, W Zhang, et al. Textured metastable VO2(B) thin films on SrTiO3 substrates with significantly enhanced conductivity. Appl Phys Lett 2014, 104: 071909.
[15]
A Rúa, RD Díaz, S Lysenko, et al. Semiconductor-insulator transition in VO2(B) thin films grown by pulsed laser deposition. J Appl Phys 2015, 118: 125308.
[16]
S Lee, IN Ivanov, JK Keum, et al. Epitaxial stabilization and phase instability of VO2 polymorphs. Sci Rep 2016, 6: 19621.
[17]
A Srivastava, H Rotella, S Saha, et al. Selective growth of single phase VO2 (A, B, and M) polymorph thin films. APL Mater 2015, 3: 026101.
[18]
MB Sahana, MS Dharmaprakash, SA Shivashankar. Microstructure and properties of VO2 thin films deposited by MOCVD from vanadyl acetylacetonate. J Mater Chem 2002, 12: 333-338.
[19]
X-J Wang, Y-J Fei, Y-Y Xiong, et al. Vanadium oxide thin films deposited on indium tin oxide glass by radio-frequency magnetron sputtering. Chinese Phys 2002, 11: 737-740.
[20]
H Miyazaki, F Utsuno, Y Shigesato, et al. The structural characteristics of VOx films prepared by He-introduced reactive RF unbalanced magnetron sputtering. Thin Solid Films 1996, 281-282: 436-440.
[21]
H Liu, D Wan, A Ishaq, et al. Sputtering deposition of sandwich-structured V2O5/metal (V, W)/V2O5 multilayers for the preparation of high-performance thermally sensitive VO2 thin films with selectivity of VO2(B) and VO2(M) polymorph. ACS Appl Mater Interfaces 2016, 8: 7884-7890.
[22]
XJ Wang, HD Li, YJ Fei, et al. XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering. Appl Surf Sci 2001, 177: 8-14.
[23]
P Xiong. Study on the preparation and properties of tungsten graded doping vanadium oxide (V1-xWxO2) thermal films. Master Thesis. Shanghai University, 2016.
[24]
M Pan, HM Zhong, SW Wang, et al. Properties of VO2 thin film prepared with precursorVO(acac)2. J Cryst Growth 2004, 265: 121-126.
[25]
PJ Desré, AR Yavari. Suppression of crystal nucleation in amorphous layers with sharp concentration gradients. Phys Rev Lett 1990, 64: 1533-1536.
[26]
CK Liddiard, O Reinhold, U Ringh, et al. Test structures and performance analysis for uncooled resistance bolometer detector arrays. In: Proceedings of the SPIE 3379, Infrared Detectors and Focal Plane Arrays V, 1998: 115-125;
[27]
JB Goodenough. The two components of the crystallographic transition in VO2. J Solid State Chem 1971, 3: 490-500.
[28]
J-H Li, Y-N Yi. Temperature coefficient of resistance of VO2 polycrystalline film formed by ion beam enhanced deposition. Acta Phys Sin 2004, 53: 2683-2686.
[29]
B Felde, W Niessner, D Schalch, et al. Plasmon excitation in vanadium dioxide films. Thin Solid Films 1997, 305: 61-65.
Journal of Advanced Ceramics
Pages 196-206
Cite this article:
ZHANG C, HU D, GU H, et al. Crystallization and inter-diffusional behaviors in the formation of VO2(B) thin film with layered W-doping. Journal of Advanced Ceramics, 2017, 6(3): 196-206. https://doi.org/10.1007/s40145-017-0231-7

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Received: 25 February 2017
Revised: 19 April 2017
Accepted: 13 May 2017
Published: 29 September 2017
© The author(s) 2017

Open Access The articles published in this journal are distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons. org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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