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Research Article | Open Access

Mode transition from adsorption removal to bombardment removal induced by nanoparticle-surface collisions in fluid jet polishing

Xuechu ZHAO1, Liran MA2, Xuefeng XU1()
School of Technology, Beijing Forestry University, Beijing 100083, China
State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China
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Abstract

The effects of impacting particles from a jet of liquid on the removal of a surface material (on the impacted workpiece) were investigated. Experimental observations show that the cross section of the material removed changed from 'W'-shaped to 'U'-shaped as the size of abrasive particles was increased. Comparisons between removed material profiles and particle collision distributions indicate that the particle-surface collisions are the main reason for the material removal. The deduced number of atoms removed by a single collision implies that a transition occurs in the removal mode. For nanoscale particles, the polished surface is likely to be removed in an atom-by-atom manner, possibly due to the chemisorption of the impacting particles on the impacted surface. Contrarily, for the case of microscale particles, bulk material removal produced by particle bombardment is more likely to occur. The present mechanism of material removal for particle-surface collisions is further corroborated experimentally.

Keywords

ultra-smooth surfacefluid jet polishingnanoparticle-surface collisionmaterial removal

References

[1]
Brown N J. Preparation of ultrasmooth surfaces. Annu Rev Mater Sci 16: 371-388 (1986)
Crossref Google Scholar
[2]
Lee J W, Ha S J, Hong K P, Cho Y K, Kim K B, Kim B C, Cho M W. A study on the analysis method of shape quality and the micro burr removal on a micro pyramid pattern using the micro MR fluid jet polishing system. Smart Mater Struct 25(4): 045001 (2016)
Crossref Google Scholar
[3]
Katoh J, Arima K, Kubota A, Mimura H, Inagaki K, Mori Y, Yamauchi K, Endo K. Atomic-scale evaluation of Si (111) surfaces finished by the planarization process utilizing SiO2 particles mixed with water. J Electrochem Soc 153(6): G560-G565 (2006)
Crossref Google Scholar
[4]
Peng W Q, Guan C L, Li S Y. Efficient fabrication of ultrasmooth and defect-free quartz glass surface by hydrodynamic effect polishing combined with ion beam figuring. Opt Express 22(11): 13951-13961 (2014)
Crossref Google Scholar
[5]
Ando M, Negishi M, Takimoto M, Deguchi A, Nakamura N. Super-smooth polishing on aspherical surfaces. Nanotechnology 6(4): 111-120 (1995)
Crossref Google Scholar
[6]
Zhang Z Y, Wang B, Kang R K, Zhang B, Guo D M. Changes in surface layer of silicon wafers from diamond scratching. CIRP Ann 64(1): 349-352 (2015)
Crossref Google Scholar
[7]
Zhang Z Y, Guo D M, Wang B, Kang R K, Zhang B. A novel approach of high speed scratching on silicon wafers at nanoscale depths of cut. Sci Rep 5: 16395 (2015)
Crossref Google Scholar
[8]
Wang B, Zhang Z Y, Chang K K, Cui J F, Rosenkranz A, Yu J H, Lin C T, Chen G X, Zang K T, Luo J, et al. New deformation-induced nanostructure in silicon. Nano Lett 18(7): 4611-4617 (2018)
Crossref Google Scholar
[9]
Lei H, Luo J B. CMP of hard disk substrate using a colloidal SiO2 slurry: Preliminary experimental investigation. Wear 257(5-6): 461-470 (2004)
Crossref Google Scholar
[10]
Tsai H J, Jeng Y R, Huang P Y. Elasto-partial hydrodynamic contact model for chemical mechanical polishing. J Electron Mater 153(12): G1072-G1077 (2006)
Crossref Google Scholar
[11]
Chen H, Guo D, Xie G X, Pan G S. Mechanical model of nanoparticles for material removal in chemical mechanical polishing process. Friction 4(2): 153-164 (2016)
Crossref Google Scholar
[12]
Mori Y, Yamauchi K, Endo K, Ide T, Toyota H, Nishizawa K, Hasegawa M. Evaluation of elastic emission machined surfaces by scanning tunneling microscopy. J Vac Sci Technol A 8(1): 621-624 (1990)
Crossref Google Scholar
[13]
Kanaoka M, Takino H, Nomura K, Mori Y, Mimura H, Yamauchi K. Removal properties of low-thermal-expansion materials with rotating-sphere elastic emission machining. Sci Technol Adv Mater 8(3): 170-172 (2007)
Crossref Google Scholar
[14]
Fähnle O W, Van Brug H, Frankena H J. Fluid jet polishing of optical surfaces. Appl Opt 37(28): 6771-6773 (1998)
Crossref Google Scholar
[15]
Zhang F H, Song X Z, Zhang Y, Luan D R. Figuring of an ultra-smooth surface in nanoparticle colloid jet machining. J Micromech Microeng 19(5): 054009 (2009)
Crossref Google Scholar
[16]
Booij S M, Van Brug H H, Braat J J M, Faehnle O W. Nanometer deep shaping with fluid jet polishing. Opt Eng 41(8): 1926-1931 (2002)
Crossref Google Scholar
[17]
Chen F J, Wang H, Tang Y, Yin S H, Huang S, Zhang G H, Novel cavitation fluid jet polishing process based on negative pressure effects. Ultrason Sonochem 42: 339-346 (2018)
Crossref Google Scholar
[18]
Liu X C, Liang Z W, Wen G L, Yuan X F. Waterjet machining and research developments: A review. The Int J Adv Manuf Technol 102(5-8): 1257-1335 (2019)
Crossref Google Scholar
[19]
Chen F J, Miao X L, Tang Y, Yin S H. A review on recent advances in machining methods based on abrasive jet polishing (AJP). Int J Adv Manuf Technol 90(1-4): 785-799 (2017)
Crossref Google Scholar
[20]
Guo Z F, Jin T, Ping L, Lu A G, Qu M N. Analysis on a deformed removal profile in FJP under high removal rates to achieve deterministic form figuring. Precis Eng 51: 160-168 (2018)
Crossref Google Scholar
[21]
Cao Z C, Cheung C F, Ren M J. Modelling and characterization of surface generation in fluid jet polishing. Precis Eng 43: 406-417 (2016)
Crossref Google Scholar
[22]
Zhu H T. Study on erosion mechanisms and polishing technology of hard-brittle materials machined with precision abrasive waterjet. Ph.D Thesis. Jinan (China): Shandong University, 2007.
[23]
Matsumura T, Muramatsu T, Fueki S. Abrasive water jet machining of glass with stagnation effect. CIRP Ann 60(1): 355-358 (2011)
Crossref Google Scholar
[24]
Tsai F C, Yan B H, Kuan C Y, Huang F Y. A Taguchi and experimental investigation into the optimal processing conditions for the abrasive jet polishing of SKD61 mold steel. Int J Mach Tools Manuf 48(7-8): 932-945 (2008)
Crossref Google Scholar
[25]
Xu J, Luo J B, Lu X C, Wang L L, Pan G S, Wen S Z. Atomic scale deformation in the solid surface induced by nanoparticle impacts. Nanotechnology 16(6): 859-864 (2005)
Crossref Google Scholar
[26]
Peng W Q, Guan C L, Li S Y. Material removal mode affected by the particle size in fluid jet polishing. Appl Opt 52(33): 7927-7933 (2013)
Crossref Google Scholar
[27]
Peng W Q, Guan C L, Li S Y. Material removal mechanism of ceria particles with different sizes in glass polishing. Opt Eng 53(3): 035104 (2014)
Crossref Google Scholar
[28]
Hoshino T, Kurata Y, Terasaki Y, Susa K. Mechanism of polishing of SiO2 films by CeO2 particles. J Non-Cryst Solids 283(1-3): 129-136 (2001)
Crossref Google Scholar
[29]
Yamauchi K, Hirose K, Goto H, Sugiyama K, Inagaki K, Yamamura K, Sano Y, Mori Y. First-principles simulations of removal process in EEM (Elastic Emission Machining). Comput Mater Sci 14(1-4): 232-235 (1999)
Crossref Google Scholar
[30]
Wang Y L, Liu C, Chang S T, Tsai M S, Feng M S, Tseng W T. Chemical-mechanical polishing of low-dielectric-constant spin-on-glasses: Film chemistries, slurry formulation and polish selectivity. Thin Solid Films 308-309: 550-554 (1997)
Crossref Google Scholar
[31]
Cook L M. Chemical processes in glass polishing. J Non-Cryst Solids 120(1-3): 152-171 (1990)
Crossref Google Scholar
[32]
Arima K, Kubota A, Mimura H, Inagaki K, Endo K, Mori Y, Yamauchi K. Highly resolved scanning tunneling microscopy study of Si(001) surfaces flattened in aqueous environment. Surf Sci 600(15): 185-188 (2006)
Crossref Google Scholar
[33]
Peng W Q, Li S Y, Guan C L, Shen X M, Dai Y F, Wang Z. Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing. Opt Eng 52(4): 043401 (2013)
Crossref Google Scholar
[34]
Xu X F, Luo J B, Guo D. Nanoparticle-wall collision in a laminar cylindrical liquid jet. J Colloid Interface Sci 359(2): 334-338 (2011)
Crossref Google Scholar
[35]
Xu X F, Luo J B, Lu X C, Zhang C H, Guo D. Effect of nanoparticle impact on material removal. Tribol Trans 51(6): 718-722 (2008)
Crossref Google Scholar
[36]
Stace A J. Molecular dynamic simulations of the elastic and inelastic surface scattering of nanoparticles. Phys Chem Chem Phys 16(7): 3077-3086 (2014)
Crossref Google Scholar
[37]
Suri M, Dumitrică T. Efficient sticking of surface-passivated Si nanospheres via phase-transition plasticity. Phys Rev B 78(8): 081405 (2008)
Crossref Google Scholar
[38]
Anders C, Bringa E M, Urbassek H M. Crater production by energetic nanoparticle impact on Au nanofoams. Appl Phys Lett 108(11): 113108 (2016)
Crossref Google Scholar
[39]
Chen R L, Zhang D, Wu Y H. Study on the influence of standoff distance on substrate damage under an abrasive water jet process by molecular dynamics simulation. Friction 6(2): 195-207 (2018)
Crossref Google Scholar
[40]
Valentini P, Dumitrică T. Microscopic theory for nanoparticle-surface collisions in crystalline silicon. Phys Rev B 75(22): 224106 (2007)
Crossref Google Scholar
[41]
Lv Z, Huang C Z, Zhu H T, Wang J, Hou R G. A 3D simulation of the fluid field at the jet impinging zone in ultrasonic-assisted abrasive waterjet polishing. Int J Adv Manuf Technol 87(9-12): 3091-3103 (2016)
Crossref Google Scholar
[42]
Ramezanpour A, Mirzaee I, Firth D, Shirvani H. A numerical heat transfer study of slot jet impinging on an inclined plate. Int J Numer Methods Heat Fluid Flow 17(7): 661-676 (2007)
Crossref Google Scholar
[43]
Takei Y, Mimura H. Effect of focusing flow on stationary spot machining properties in elastic emission machining. Nanoscale Res Lett 8(1): 237 (2013)
Crossref Google Scholar
[44]
Liu H, Wang J, Kelson N, Brown R J. A study of abrasive waterjet characteristics by CFD simulation. J Mater Process Technol 153-154: 488-493 (2004)
Crossref Google Scholar
[45]
Sharif MA R, Mothe K K. Evaluation of turbulence models in the prediction of heat transfer due to slot jet impingement on plane and concave surfaces. Numer Heat Tranf Part B: Fundam 55(4): 273-294 (2009)
Crossref Google Scholar
[46]
Yamauchi K, Mimura H, Inagaki K, Mori Y. Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining. Rev Sci Instrum 73(11): 4208-4033 (2002)
Crossref Google Scholar
[47]
Loc P H, Shiou F J, Yu Z R, Hsu W Y. Investigation of optimal air-driving fluid jet polishing parameters for the surface finish of N-BK7 optical glass. J Manuf Sci Eng 135(1): 011015 (2013)
Crossref Google Scholar
[48]
Kubota A, Shinbayashi Y, Mimura H, San Y, Inagaki K, Mori Y, Yamauchi K. Investigation of the surface removal process of silicon carbide in elastic emission machining. J Electron Mater 36(1): 92-97 (2007)
Crossref Google Scholar
Friction
Volume 9 Issue 5,
October 2021
Pages 1127-1137
DOI: 10.1007/s40544-020-0408-x
Cite this article:
ZHAO X, MA L, XU X. Mode transition from adsorption removal to bombardment removal induced by nanoparticle-surface collisions in fluid jet polishing. Friction, 2021, 9(5): 1127-1137. https://doi.org/10.1007/s40544-020-0408-x
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