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Research Article | Open Access

Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond

Song YUAN, Xiaoguang GUO, Hao WANG, Renke KANG, Shang GAO( )
State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China
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Graphical Abstract

Abstract

The roughness of the contact surface exerts a vital role in rubbing. It is still a significant challenge to understand the microscopic contact of the rough surface at the atomic level. Herein, the rough surface with a special root mean square (RMS) value is constructed by multivariate Weierstrass–Mandelbrot (W–M) function and the rubbing process during that the chemical mechanical polishing (CMP) process of diamond is mimicked utilizing the reactive force field molecular dynamics (ReaxFF MD) simulation. It is found that the contact area A/A0 is positively related with the load, and the friction force F depends on the number of interfacial bridge bonds. Increasing the surface roughness will increase the friction force and friction coefficient. The model with low roughness and high lubrication has less friction force, and the presence of polishing liquid molecules can decrease the friction force and friction coefficient. The RMS value and the degree of damage show a functional relationship with the applied load and lubrication, i.e., the RMS value decreases more under larger load and higher lubrication, and the diamond substrate occurs severer damage under larger load and lower lubrication. This work will generate fresh insight into the understanding of the microscopic contact of the rough surface at the atomic level.

Keywords

diamondrandom roughnessreactive force field molecular dynamics (ReaxFF MD)frictionWeierstrass–Mandelbrot (W–M) functionchemical mechanical polishing (CMP)

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Friction
Volume 12 Issue 6,
June 2024
Pages 1119-1132
DOI: 10.1007/s40544-023-0760-8
Cite this article:
YUAN S, GUO X, WANG H, et al. Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond. Friction, 2024, 12(6): 1119-1132. https://doi.org/10.1007/s40544-023-0760-8

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Received: 01 January 2023
Revised: 11 February 2023
Accepted: 15 March 2023
Published: 04 July 2023
© The author(s) 2023.

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