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Research paper | Open Access

Genetic dissection of tetraploid cotton resistant to Verticillium wilt using interspecific chromosome segment introgression lines

Peng Wanga,Zhiyuan NingaLing LinbHong ChencHongxian MeiaJun ZhaoaBingliang LiuaXin ZhangaWangzhen GuoaTianzhen Zhanga( )
National Key Laboratory of Crop Genetics & Germplasm Enhancement, Cotton Research Institute, Nanjing Agricultural University, Nanjing 210095, China
Institute of Plant Protection, Jiangsu Academy of Agricultural Sciences, Nanjing 210014, China
Cotton Research Institute, Xinjiang Academy of Agriculture and Reclamation Sciences, Xinjiang 832000, China

Peer review under responsibility of Crop Science Society of China and Institute of Crop Science, CAAS.

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Abstract

Verticillium wilt (caused by the pathogen Verticillium dahliae) is of high concern for cotton producers and consumers. The major strategy for controlling this disease is the development of resistant cotton (Gossypium spp.) cultivars. We used interspecific chromosome segment introgression lines (CSILs) to identify quantitative trait loci (QTL) associated with resistance to Verticillium wilt in cotton grown in greenhouse and inoculated with three defoliating V. dahliae isolates. A total of 42 QTL, including 23 with resistance-increasing and 19 with resistance-decreasing, influenced host resistance against the three isolates. These QTL were identified and mapped on 18 chromosomes (chromosomes A1, A3, A4, A5, A7, A8, A9, A12, A13, D1, D2, D3, D4, D5, D7, D8, D11, and D12), with LOD values ranging from 3.00 to 9.29. Among the positive QTL with resistance-increasing effect, 21 conferred resistance to only one V. dahliae isolate, suggesting that resistance to V. dahliae conferred by most QTL is pathogen isolate-specific. The At subgenome of cotton had greater effect on resistance to Verticillium wilt than the Dt subgenome. We conclude that pyramiding different resistant QTL could be used to breed cotton cultivars with broad-spectrum resistance to Verticillium wilt.

The Crop Journal
Pages 278-288
Cite this article:
Wang P, Ning Z, Lin L, et al. Genetic dissection of tetraploid cotton resistant to Verticillium wilt using interspecific chromosome segment introgression lines. The Crop Journal, 2014, 2(5): 278-288. https://doi.org/10.1016/j.cj.2014.06.007

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Received: 25 January 2014
Revised: 05 June 2014
Accepted: 03 July 2014
Published: 12 July 2014
© 2014 Crop Science Society of China and Institute of Crop Science, CAAS. All rights reserved.
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