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Paper | Open Access

Precision integration of grating-based polarizers onto focal plane arrays of near-infrared photovoltaic detectors for enhanced contrast polarimetric imaging

Bo Feng1Yifang Chen1 ( )Duo Sun2Zongyao Yang1Bo Yang2Xue Li2Tao Li2( )
Nanolithography and Application Research Group, State Key Laboratory of ASIC and System, School of Information Science and Technology, Fudan University, Shanghai 200433, People’s Republic of China
State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People’s Republic of China
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Abstract

Polarimetric imaging enhances the ability to distinguish objects from a bright background by detecting their particular polarization status, which offers another degree of freedom in infrared remote sensing. However, to scale up by monolithically integrating grating-based polarizers onto a focal plane array (FPA) of infrared detectors, fundamental technical obstacles must be overcome, including reductions of the extinction ratio by the misalignment between the polarizer and the detector, grating line width fluctuations, the line edge roughness, etc. This paper reports the authors’ latest achievements in overcoming those problems by solving key technical issues regarding the integration of large-scale polarizers onto the chips of FPAs with individual indium gallium arsenide/indium phosphide (InGaAs/InP) sensors as the basic building blocks. Polarimetric and photovoltaic chips with divisions of the focal plane of 540 × 4 pixels and 320 × 256 superpixels have been successfully manufactured. Polarimetric imaging with enhanced contrast has been demonstrated. The progress made in this work has opened up a broad avenue toward industrialization of high quality polarimetric imaging in infrared wavelengths.

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International Journal of Extreme Manufacturing
Pages 035201-035201
Cite this article:
Feng B, Chen Y, Sun D, et al. Precision integration of grating-based polarizers onto focal plane arrays of near-infrared photovoltaic detectors for enhanced contrast polarimetric imaging. International Journal of Extreme Manufacturing, 2021, 3(3): 035201. https://doi.org/10.1088/2631-7990/abf5c8

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Received: 01 July 2020
Revised: 02 December 2020
Accepted: 07 April 2021
Published: 30 April 2021
© 2021 The Author(s).

Original content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

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