Material manufacturing from atomic layer

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Hu Q M, Wu C X, Dong Z, Zhang G X, Ma Z H, Wang X H, Sun S H and Xu J Q 2022 Direct confirmation of confinement effects by NiO confined in helical SnO₂ nanocoils and its application in sensors J. Mater. Chem. A 10 2786–94

Wa Q B, Xiong W, Zhao R, He Z Y, Chen Y and Wang X W 2019 Nanoscale Ni(OH)_x films on carbon cloth prepared by atomic layer deposition and electrochemical activation for glucose sensing ACS Appl. Nano Mater. 2 4427–34

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Yu F, Du L, Zhang G X, Su F M, Wang W C and Sun S H 2020 Electrode engineering by atomic layer deposition for sodium-ion batteries: from traditional to advanced batteries Adv. Funct. Mater. 30 1906890

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Xiong W, Guo Z, Li H, Zhao R and Wang X W 2017 Rational bottom-up engineering of electrocatalysts by atomic layer deposition: a case study of Fe_xCo_1–xS_y-based catalysts for electrochemical hydrogen evolution ACS Energy Lett. 2 2778–85

Chen Z S, Zhang G X, Prakash J, Zheng Y and Sun S H 2019 Rational design of novel catalysts with atomic layer deposition for the reduction of carbon dioxide Adv. Energy Mater. 9 1900889

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Su Y T, Cui S H, Zhuo Z Q, Yang W L, Wang X W and Pan F 2015 Enhancing the high-voltage cycling performance of LiNi_0.5Mn_0.3Co_0.2O₂ by retarding its interfacial reaction with an electrolyte by atomic-layer-deposited Al₂O₃ ACS Appl. Mater. Interfaces 7 25105–12

Li J W, Xiang J R, Yi G, Tang Y T, Shao H C, Liu X, Shan B and Chen R 2022 Reduction of surface residual lithium compounds for single-crystal LiNi_0.6Mn_0.2Co_0.2O₂ via Al₂O₃ atomic layer deposition and post-annealing Coatings 12 84

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Li J X, Chai G D and Wang X W 2023 Atomic layer deposition of thin films: from a chemistry perspective Int. J. Extrem. Manuf. 5 032003

Zhao R, Guo Z and Wang X W 2018 Surface chemistry during atomic-layer deposition of nickel sulfide from nickel amidinate and H₂S J. Phys. Chem. C 122 21514–20

Zhao R, Xiao S, Yang S H and Wang X W 2019 Surface thermolytic behavior of nickel amidinate and its implication on the atomic layer deposition of nickel compounds Chem. Mater. 31 5172–80

Wang X W, Dong L, Zhang J Y, Liu Y Q, Ye P D and Gordon R G 2013 Heteroepitaxy of La₂O₃ and La_2–xY_xO₃ on GaAs (111)A by atomic layer deposition: achieving low interface trap density Nano Lett. 13 594–9

Cao K, Cai J M and Chen R 2020 Inherently selective atomic layer deposition and applications Chem. Mater. 32 2195–207

Cao K, Cai J M, Liu X and Chen R 2018 Review article: Catalysts design and synthesis via selective atomic layer deposition J. Vac. Sci. Technol. A 36 010801

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Li J Y, Zhang Y Q, Wang J L, Yang H, Zhou X L, Chan M S, Wang X W, Lu L and Zhang S D 2022 High-performance self-aligned top-gate amorphous InGaZnO TFTs with 4 nm-thick atomic-layer-deposited AlO_x insulator IEEE Electron Device Lett. 43 729–32

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Zhao R, Gao Y H, Guo Z, Su Y T and Wang X W 2017 Interface energy alignment of atomic-layer-deposited VO_x on pentacene: an in situ photoelectron spectroscopy investigation ACS Appl. Mater. Interfaces 9 1885–90

Zhu J H, Zhao R, Shi J M, Wa Q B, Zhang M and Wang X W 2021 Metal exchange and diffusion during atomic layer deposition of cobalt and nickel sulfides Chem. Mater. 33 9403–12

Li H, Zhao R, Zhu J H, Guo Z, Xiong W and Wang X W 2020 Organosulfur precursor for atomic layer deposition of high-quality metal sulfide films Chem. Mater. 32 8885–94

Li Z S, Xiang J R, Liu X, Li X B, Li L J, Shan B and Chen R 2022 A combined multiscale modeling and experimental study on surface modification of high-volume micro-nanoparticles with atomic accuracy Int. J. Extrem. Manuf. 4 025101

Xiong W, Guo Q, Guo Z, Li H, Zhao R, Chen Q, Liu Z W and Wang X W 2018 Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution J. Mater. Chem. A 6 4297–303

Gao Y H, Shao Y D, Yan L J, Li H, Su Y T, Meng H and Wang X W 2016 Metal/organic interfaces: efficient charge injection in organic field-effect transistors enabled by low-temperature atomic layer deposition of ultrathin VO_x interlayer (Adv. Funct. Mater. 25/2016) Adv. Funct. Mater. 26 4615

Zhou B Z, Liu M J, Wen Y W, Li Y and Chen R 2020 Atomic layer deposition for quantum dots based devices Opto-Electron. Adv. 3 190043

Jiang C C, Cao K, Zhou B Z, Wen Y W, Shan B and Chen R 2020 Atomic scale composite oxides infiltration to quantum dot photodetector with ultralow dark current ACS Appl. Electron. Mater. 2 155–62