Improvement in the planarization of 4H-SiC(0001) achieved by photo-assisted chemical mechanical polishing (P-CMP) using nano TiO2-based composite abrasive with heterostructure
)Graphical Abstract
Abstract
The planarization of silicon carbide (SiC), which is crucial for manufacturing power devices resilient to harsh working environments, has garnered significant attention. The utilization of titanium dioxide (TiO2)-based heterogeneous photocatalysts offers a promising avenue for achieving efficient polishing of SiC surfaces through photo-assisted chemical mechanical polishing (P-CMP) in an environmentally friendly manner. In this study, we employed nanodiamonds (NDs) and graphene oxide (GO) to fabricate a composite of TiO2/ND/GO abrasives. Subsequently, the P-CMP performance of TiO2/NDs/GO on the Si face of SiC was systematically investigated. High-resolution transmission electron microscopy (TEM) revealed the heterostructure between TiO2 and the NDs. Furthermore, the P-CMP results indicate that the heterostructure significantly enhances the polishing rate of the composite abrasives on SiC, achieving the highest material removal rate (MRR) of 600 nm/h and reducing the average surface roughness (Sa) to 1.1705 nm. Additionally, owing to the lubricating and dispersing effects of GO, the occurrence of ND aggregation is avoided, preventing scratching on SiC. The measurement of the ·OH concentration indicates that an increase in the ·OH concentration is the primary factor contributing to the improvement in the MRR. The results from wetting angle and friction coefficient tests revealed that the polishing slurry containing TiO2/NDs/GO exhibited excellent wettability and provided sufficient frictional force on the SiC surface. X-ray photoelectron spectroscopy (XPS) characterization demonstrated that TiO2/NDs/GO enhanced the degree of oxidation of the SiC surface, leading to the formation of a softer oxide layer. Finally, on the basis of the experimental and characterization results, a comprehensive analysis of TiO2/NDs/GO and P-CMP was conducted.
Keywords
Electronic Supplementary Material
References
Zhang X, Pan G S, Wang W Q, Guo D. Polishing behavior of PS/SiO2 core–shell nanoparticles with different shell thickness on fused silica Chemical Mechanical Polishing. IOP Conf Ser-Mat Sci 563(2): 022048 (2019)
Kang C X, Guo D, Zhang X, Zou C L, Pan G S. The deterioration characteristics and mechanism of polishing pads in chemical mechanical polishing of fused silica. ECS J Solid State Sc 8(1): P7–P11 (2019)
Ma G L, Li S J, Liu F L, Zhang C, Jia Z, Yin X C. A review on precision polishing technology of single-crystal SiC. Crystals 12(1): 101 (2022)
Zhou Y, Pan G S, Shi X L, Gong H, Luo G H, Gu Z H. Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry. Surf Coat Tech 251: 48–55 (2014)
Liu D D, Zhang Z Y, Zhou H X, Deng X Q, Shi C J, Meng F N, Yu Z B, Feng J Y. Angstrom surface on copper induced by novel green chemical mechanical polishing using ceria and silica composite abrasives. Appl Surf Sci 640: 158382 (2023)
Zhang Z Y, Liao L X, Wang X Z, Xie W X, Guo D M. Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy. Appl Surf Sci 506: 144670 (2020)
Xie W X, Zhang Z Y, Liao L X, Liu J, Su H J, Wang S D, Guo D M. Green chemical mechanical polishing of sapphire wafers using a novel slurry. Nanoscale 12(44): 22518–22526 (2020)
Chen H, Guo D, Xie G X, Pan G S. Mechanical model of nanoparticles for material removal in chemical mechanical polishing process. Friction 4(2): 153–164 (2016)
Liao L X, Zhang Z Y, Meng F N, Liu D D, Wu B, Li Y B, Xie W X. A novel slurry for chemical mechanical polishing of single crystal diamond. Appl Surf Sci 564: 150431 (2021)
Shi C J, Fan Y H, Zhang Z Y, Deng X Q, Yu J X, Zhou H X, Meng F N, Feng J Y. Development of core–shell SiO2@A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica. Appl Surf Sci 652: 159293 (2024)
Kang C X, Gao B, Guo D, Luo H M, Pan G S. The cycle characteristics of slurries in chemical mechanical polishing (CMP) of fused silica. ChemistrySelect 5(30): 9350–9356 (2020)
Cui X, Zhang Z, Yu S, Chen X, Shi C, Zhou H, Meng F, Yu J, Wen W. Unprecedented atomic surface of silicon induced by environmentally friendly chemical mechanical polishing. Nanoscale 15(21): 9304–9314 (2023)
Liu L, Zhang Z, Shi C, Zhou H, Liu D, Li Y, Xu G, Feng J, Meng F. Atomic surface of fused silica and polishing mechanism interpreted by molecular dynamics and density functional theory. Mater Today Sustain 23: 100457 (2023)
Liu Z S, Zhang Z Y, Sui Y F, Peng Q B, Li J Q, Shi C J, Zheng J S, Tian B. Development of mesoporous abrasives and its unprecedented polishing performance elucidated by a novel atomic model. Mater Today Sustain 25: 100700 (2024)
Lin Y C, Kao C H. A study on surface polishing of SiC with a tribochemical reaction mechanism. Int J Adv Manuf Tech 25(1): 33–40 (2005)
Chen S D, Lei H. Polishing performance and mechanism of a novel Fe-based slurry for chemical mechanical polishing. Tribol Int 194: 109549 (2024)
Yuan Z W, He Y, Sun X W, Wen Q. UV-TiO2 photocatalysis-assisted chemical mechanical polishing 4H-SiC wafer. Mater Manuf Process 33(11): 1214–1222 (2018)
Zhou Y, Pan G S, Zou C L, Wang L. Chemical mechanical polishing (CMP) of SiC wafer using photo-catalyst incorporated pad. ECS J Solid State Sc 6(9): P603–P608 (2017)
Wang W T, Zhang B G, Shi Y H, Ma T D, Zhou J K, Wang R, Wang H X, Zeng N Y. Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2. J Mater Process Tech 295: 117150 (2021)
Wang W T, Zhang B G, Shi Y H, Zhou J K, Wang R, Zeng N Y. Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect. Appl Surf Sci 575: 151676 (2022)
He Y, Yuan Z W, Song S Y, Gao X J, Deng W J. Investigation on material removal mechanisms in photocatalysis-assisted chemical mechanical polishing of 4H–SiC wafers. Int J Precis Eng Man 22(5): 951–963 (2021)
Lu J, Wang Y G, Luo Q F, Xu X P. Photocatalysis assisting the mechanical polishing of a single-crystal SiC wafer utilizing an anatase TiO2-coated diamond abrasive. Precis Eng 49: 235–242 (2017)
Zhao Y, Linghu X Y, Shu Y, Zhang J W, Chen Z, Wu Y, Shan D, Wang B Q. Classification and catalytic mechanisms of heterojunction photocatalysts and the application of titanium dioxide (TiO2)-based heterojunctions in environmental remediation. J Environ Chem Eng 10(3): 108077 (2022)
Su L X, Cao Y, Hao H S, Zhao Q, Zhi J F. Emerging applications of nanodiamonds in photocatalysis. Funct Diam 1(1): 93–109 (2021)
Pastrana-Martínez L M, Morales-Torres S, Carabineiro S A C, Buijnsters J G, Figueiredo J L, Silva A M T, Faria J L. Photocatalytic activity of functionalized nanodiamond–TiO2 composites towards water pollutants degradation under UV/vis irradiation. Appl Surf Sci 458: 839–848 (2018)
Henych J, Stehlík Š, Mazanec K, Tolasz J, Jan Č, Rezek B, Mattsson A, Lars Ö. Reactive adsorption and photodegradation of soman and dimethyl methylphosphonate on TiO2/nanodiamond composites. Appl Catal B-Environ 259: 118097 (2019)
Huang S Q, Li X L, Mu D K, Cui C C, Huang H, Huang H. Polishing performance and mechanism of a water-based nanosuspension using diamond particles and GO nanosheets as additives. Tribol Int 164: 107241 (2021)
Wang X Q, Dai L L, He S Y, Wang Y B, Zhang Y K. A novel biomineralization regulation strategy to fabricate schwertmannite/graphene oxide composite for effective light-assisted oxidative degradation of sulfathiazole. Sep Purif Technol 312: 123314 (2023)
Kang Y G, Chi Vu H, Chang Y Y, Chang Y S. Fe(III) adsorption on graphene oxide: A low-cost and simple modification method for persulfate activation. Chem Eng J 387: 124012 (2020)
Singhania A, Bhaskarwar A N. Effect of rare earth (RE–La, Pr, Nd) metal-doped ceria nanoparticles on catalytic hydrogen iodide decomposition for hydrogen production. Int J Hydrogen Energ 43(10): 4818–4825 (2018)
Kim K D, Dey N K, Seo H O, Kim Y D, Lim D C, Lee M. Photocatalytic decomposition of toluene by nanodiamond-supported TiO2 prepared using atomic layer deposition. Appl Catal A-Gen 408(1-2): 148–155 (2011)
Petit T, Puskar L. FTIR spectroscopy of nanodiamonds: Methods and interpretation. Diam Relat Mater 89: 52–66 (2018)
Xing R, He J J, Hao P L, Zhou W J. Graphene oxide-supported nanoscale zero-valent iron composites for the removal of atrazine from aqueous solution. Colloid Surface A 589: 124466 (2020)
Yang L, Xu L, Bai X, Jin P K. Enhanced visible-light activation of persulfate by Ti3+ self-doped TiO2/graphene nanocomposite for the rapid and efficient degradation of micropollutants in water. J Hazard Mater 365: 107–117 (2019)
Nguyen V T, Fang T H. Revealing the mechanisms for inactive rolling and wear behaviour on chemical mechanical planarization. Appl Surf Sci 595: 153524 (2022)
Zhou Y, Pan G S, Shi X L, Xu L, Zou C L, Gong H, Luo G H. XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP). Appl Surf Sci 316: 643–648 (2014)
Wu P, Chen X C, Zhang C H, Luo J B. Synergistic tribological behaviors of graphene oxide and nanodiamond as lubricating additives in water. Tribol Int 132: 177–184 (2019)
京公网安备11010802044758号