Erratum to: Strategies to obtain pattern fidelity in nanowire growth from large-area surfaces patterned using nanoimprint lithography

Gaute Otnes; Magnus Heurlin; Mariusz Graczyk; Jesper Wallentin; Daniel Jacobsson; Alexander Berg; Ivan Maximov; Magnus T. Borgström

doi:10.1007/s12274-016-1379-0

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Erratum

Erratum to: Strategies to obtain pattern fidelity in nanowire growth from large-area surfaces patterned using nanoimprint lithography

Gaute Otnes, Magnus Heurlin, Mariusz Graczyk, Jesper Wallentin^{^†}, Daniel Jacobsson^{^‡}, Alexander Berg, Ivan Maximov, Magnus T. Borgström()

Solid State PhysicsLund UniversityBox 118S-221 00LundSweden

^† Present address: Division of Synchrotron Radiation Research, Lund University, Box 118, S-221 00 Lund, Sweden

^‡ Present address: nCHREM/Centre for Analysis and Synthesis, Lund University, Box 124, S-221 00 Lund, Sweden

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The online version of the original article can be found at:

https://doi.org/10.1007/s12274-016-1165-z

Keywords

semiconductor nanowire nanoimprint lithography metal–organic vapor phase epitaxial (MOVPE)patterning

Nano Research

Volume 10 Issue 2,
February 2017

Pages 729-729

DOI: 10.1007/s12274-016-1379-0

Cite this article:

Otnes G, Heurlin M, Graczyk M, et al. Erratum to: Strategies to obtain pattern fidelity in nanowire growth from large-area surfaces patterned using nanoimprint lithography. Nano Research, 2017, 10(2): 729. https://doi.org/10.1007/s12274-016-1379-0