Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures

Lin Li; Jichen Dong; Dechao Geng; Menghan Li; Wei Fu; Feng Ding; Wenping Hu; Hui Ying Yang

doi:10.1007/s12274-022-4387-2

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Erratum

Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures

Lin Li^¹, Jichen Dong^², Dechao Geng^{³^,⁴}(), Menghan Li^¹, Wei Fu^⁵, Feng Ding^⁴, Wenping Hu^⁴, Hui Ying Yang^³

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1 Institute of Molecular Plus, Tianjin University, Tianjin 300072, China

2 Centre for Multidimensional Carbon Materials, Institute for Basic Science, Ulsan 44919, Republic of Korea

3 Pillar of Engineering Product Development, Singapore University of Technology and Design, Singapore 487372, Singapore

4 Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Department of Chemistry, School of Science, Tianjin University and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin 300072, China

5 Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology, and Research (A* STAR), Singapore 138634, Singapore

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The online version of the original article can be found at:

https://doi.org/10.1007/s12274-022-4193-x

Keywords

anisotropic etching two-dimensional materials heterostructures graphene h-BN

Nano Research

Volume 15 Issue 7,
July 2022

Pages 6790-6791

DOI: 10.1007/s12274-022-4387-2

Cite this article:

Li L, Dong J, Geng D, et al. Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures. Nano Research, 2022, 15(7): 6790-6791. https://doi.org/10.1007/s12274-022-4387-2