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Erratum

Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures

Lin Li1, Jichen Dong2, Dechao Geng3,4( ), Menghan Li1, Wei Fu5, Feng Ding4, Wenping Hu4, Hui Ying Yang3( )
Institute of Molecular Plus, Tianjin University, Tianjin 300072, China
Centre for Multidimensional Carbon Materials, Institute for Basic Science, Ulsan 44919, Republic of Korea
Pillar of Engineering Product Development, Singapore University of Technology and Design, Singapore 487372, Singapore
Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Department of Chemistry, School of Science, Tianjin University and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin 300072, China
Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology, and Research (A* STAR), Singapore 138634, Singapore
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The online version of the original article can be found at:
https://doi.org/10.1007/s12274-022-4193-x

Keywords

anisotropic etchingtwo-dimensional materialsheterostructuresgrapheneh-BN
Nano Research
Volume 15 Issue 7,
July 2022
Pages 6790-6791
DOI: 10.1007/s12274-022-4387-2
Cite this article:
Li L, Dong J, Geng D, et al. Erratum to: Multi-stage anisotropic etching of two-dimensional heterostructures. Nano Research, 2022, 15(7): 6790-6791. https://doi.org/10.1007/s12274-022-4387-2

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Published: 28 April 2022
© Tsinghua University Press 2022
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