Friction Open Access Editor-in-Chief: Jianbin Luo
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Keyword: material removal mechanism
Research Article | Open Access
Material removal mechanism of copper chemical mechanical polishing with different particle sizes based on quasi-continuum method
Aibin ZHU, Dayong HE, Shengli HE, Wencheng LUO
Published: 07 March 2017
2017, 5 (1): 99-107
Research Article | Open Access
Novel three-body nano-abrasive wear mechanism
Ruling CHEN, Shaoxian LI
Published: 27 February 2021
2022, 10 (5): 677-687
Research Article | Open Access
Chemically-induced active micro-nano bubbles assisting chemical mechanical polishing: Modeling and experiments
Lei XU, Kihong PARK, Hong LEI, [...], Pengzhan LIU, Eungchul KIM, Yeongkwang CHO, Taesung KIM, Chuandong CHEN << Fewer
Published: 25 March 2023
2023, 11 (9): 1624-1640
Research Article | Open Access
Modeling and analysis for material removal and surface roughness in fluid jet polishing of optical glass
Zhongchen CAO, Ming WANG, Haitao LIU, Tian HUANG
Published: 08 February 2024
2024, 12 (7): 1548-1563
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