TiO₂-rich Ba–Ti–O films were prepared on Pt/Ti/SiO₂/Si substrate by laser chemical vapor deposition (LCVD). Their phase relationship and microstructure were investigated. The single-phase BaTi₂O₅, Ba₄Ti₁₃O₃₀ and BaTi₅O₁₁ films were prepared at Ti/Ba molar ratios m_Ti/Ba = 1.84–1.90, 2.83 and 4.49–4.55, respectively. The high deposition rate of TiO₂-rich Ba–Ti–O films ranged from 54.0 µm/h to 177.6 µm/h. The permittivity of BaTi₂O₅ film (prepared at m_Ti/Ba = 1.84 and deposition temperature T_dep = 877 K), Ba₄Ti₁₃O₃₀ film (prepared at m_Ti/Ba = 2.83 and T_dep = 914 K) and BaTi₅O₁₁ film (prepared at m_Ti/Ba = 4.49 and T_dep = 955 K) were 50, 40 and 21, respectively.

TiO₂ thin films were prepared on Pt/Ti/SiO₂/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (P_L) and total pressure (p_tot) on the microstructure of TiO₂ thin films were investigated. The deposition temperature (T_dep) was mainly affected by P_L, increasing with P_L increasing. The single-phase rutile TiO₂ thin films with different morphologies were obtained. The morphologies of TiO₂ thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. p_tot and T_dep were the two critical factors that could be effectively used for controlling the morphology of the films.