Direct growth of graphene on dielectric or insulating materials via chemical vapor deposition (CVD) offers a novel, transfer-free approach for various applications. However, challenges remain in growing graphene on non-catalytic substrates. In particular, the low growth rate of graphene remains a significant barrier to its large-scale production. In this study, propane (C₃H₈) was used as the carbon source to prepare graphene on commercial alumina fiber fabric (AFF) via CVD, resulting in the synthesis of a novel material: graphene-skinned alumina fiber fabric (GAFF). Through comparative analysis of the graphene growth behaviors using C₃H₈ and traditional carbon sources (CH₄ and C₂H₄) on AFF, the growth mechanism of C₃H₈ was elucidated. The pyrolysis of C₃H₈ generates the unique carbon species C₃H, which exhibits distinct advantages in terms of migration, nucleation, and growth on AFF. Graphene nucleation density using C₃H₈ was found to be 160 times higher than that of CH₄ and 50 times higher than C₂H₄. The resulting GAFF exhibits a wide tunable electrical conductivity range (1 to 7000 Ω·sq⁻¹), high tensile strength (> 170 MPa), lightweight properties, flexibility, and a hierarchical macrostructure. These characteristics make GAFF a promising candidate for various applications, including electromagnetic interference (EMI) shielding.